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RSS FeedsMaterials, Vol. 11, Pages 1968: Strain Analysis of GaN HEMTs on (111) Silicon with Two Transitional AlxGa1-xN Layers (Materials)

 
 

15 october 2018 17:01:18

 
Materials, Vol. 11, Pages 1968: Strain Analysis of GaN HEMTs on (111) Silicon with Two Transitional AlxGa1-xN Layers (Materials)
 


We have designed and then grown a simple structure for high electron mobility transistors (HEMTs) on silicon, where as usual two transitional layers of AlxGa1−xN (x = 0.35, x = 0.17) have been used in order to engineer the induced strain as a result of the large lattice mismatch and large thermal expansion coefficient difference between GaN and silicon. Detailed x-ray reciprocal space mapping (RSM) measurements have been taken in order to study the strain, along with cross-section scanning electron microscope (SEM) images and x-ray diffraction (XRD) curve measurements. It has been found that it is critical to achieve a crack-free GaN HEMT epi-wafer with high crystal quality by obtaining a high quality AlN buffer, and then tuning the proper thickness and aluminium composition of the two transitional AlxGa1−xN layers. Finally, HEMTs with high performance that are fabricated on the epi-wafer have been demonstrated to confirm the success of our strain engineering and above analysis.


 
91 viewsCategory: Chemistry, Physics
 
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