Chemistry
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16 september 2020 22:21:26 |
| [ASAP] Numerical Simulation of an Entire Wafer Surface during Ozone-Based Wet Chemical Etching (Industrial & Engineering Chemistry Research) |
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Tweet Industrial & Engineering Chemistry ResearchDOI: 10.1021/acs.iecr.0c03382 |
| 213 viewsCategory: Chemistry |
 [ASAP] Evaluation of the Hydrodynamic Performance of High-Frequency Sonoreactors Using PIV (Industrial & Engineering Chemistry Research)[ASAP] The Role of Nitroxide Degradation on the Efficiency of the Controller in Nitroxide-Mediated Radical Polymerization (NMP) of Styrene (Industrial & Engineering Chemistry Research) 
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